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High Purity Sputtering Gold Target 99.999% For Magnetron Sputtering Coating

Product Details

Brand Name: HaiChuan

Certification: ISO9001

Model Number: 19

Payment & Shipping Terms

Minimum Order Quantity: 10kg

Price: $150-550/kg

Packaging Details: wooden box

Delivery Time: 10-15days

Payment Terms: L/C, D/A, D/P, T/T, Western Union, MoneyGram

Supply Ability: 10ton per month

Get Best Price
Highlight:

99.999% rare metal alloys rare

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rare metal alloys 99.999% rare

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rare metal alloys 99.999% rare

Place Of Origin:
Jiangsu, China
Material:
Gold
Shape:
Round
Chemical Composition:
Gold
Application:
Coating Process In IC And Semiconductor
Place Of Origin:
Jiangsu, China
Material:
Gold
Shape:
Round
Chemical Composition:
Gold
Application:
Coating Process In IC And Semiconductor
High Purity Sputtering Gold Target 99.999% For Magnetron Sputtering Coating

High purity Gold Sputtering Target 99.999% for Magnetron Sputtering Coating

 

A gold sputtering target is a disc-shaped material made of high-purity gold metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms from the target surface and deposit them onto a substrate to create a thin film.

 

Product name Au/Gold target
Purity 4N 99.99%
Shape Round disk
Density 19.26
Size available 2" dia.x 0.1mm, 4N
47mm dia.x 0.1mm, 4N
57mm dia.x0.1mm, 4N
or any size can customized
Shipping DHL/FedEX express

99.99% 4N Purity Au Gold Sputtering Target 50*0.1mm/57*0.2mm Au Gold disc Target

Features :

High purity: Gold sputtering targets are made from high-purity gold metal, typically 99.99% or higher, to ensure the highest quality and consistency of the deposited thin film.

Customizable size and shape: Gold sputtering targets are available in various sizes and shapes, including round, rectangular, and annular, to meet specific requirements of the sputtering process.

Good thermal and electrical conductivity: Gold sputtering targets have excellent thermal and electrical conductivity, making them suitable for a range of applications.

High melting point: Gold has a relatively low melting point of 1064°C, making it suitable for low-temperature sputtering applications.

 

Applications :

Semiconductor industry: Gold sputtering targets are used in the semiconductor industry to deposit thin films of gold and gold-based materials for integrated circuits, microprocessors, and other electronic components.

Optics industry: Gold sputtering targets are used in the optics industry to deposit thin films of gold for mirrors, filters, and other optical components.

Decorative coatings: Gold sputtering targets are used to deposit thin films of gold for decorative coatings on jewelry, watches, and other luxury items.

Medical devices: Gold sputtering targets are used in the production of medical devices, including implants and diagnostic sensors, due to gold's biocompatibility and electrical conductivity.

Aerospace industry: Gold sputtering targets are used in the aerospace industry to deposit coatings on spacecraft and satellites to improve their performance and durability.

 

 

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