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High Purity 4N5 Titanium Sputtering Target Round Discs Target For Coating

Product Details

Brand Name: HaiChuan

Certification: ISO9001

Model Number: 20

Payment & Shipping Terms

Minimum Order Quantity: 10kg

Price: $270-290/kg

Packaging Details: wooden box

Delivery Time: 10-15days

Payment Terms: L/C, D/A, D/P, T/T, Western Union, MoneyGram

Supply Ability: 10ton per month

Get Best Price
Highlight:

purity round target

,

4N5 round target

,

titanium sputtering ISO9001

Place Of Origin:
Jiangsu, China
Material:
Titanium
Shape:
Custom,round
Application:
Industry
Standard:
ASTM
Place Of Origin:
Jiangsu, China
Material:
Titanium
Shape:
Custom,round
Application:
Industry
Standard:
ASTM
High Purity 4N5 Titanium Sputtering Target Round Discs Target For Coating

high purity 4N5 titanium sputtering target round discs target for coating

 A titanium sputtering target is a disc-shaped material made of high-purity titanium metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms from the target surface and deposit them onto a substrate to create a thin film.

 

Composition
(at%)
Purity
Grain Size
Process
TiSi93/7
99.80%
<100um
HIP
TiSi92/8
99.80%
<100um
HIP
TiSi90/10
99.80%
<100um
HIP
TiSi85/15
99.80%
<100um
HIP
TiSi80/20
99.80%
<100um
HIP
TiSi75/25
99.80%
<100um
HIP

 

 
Size(mm)
Φ160×12 / Φ100×32 / Φ105×16 / Φ63×32 / 741*191*18
Customized
The maximum length of rectangular target can reach 1800mm, and the diameter of circular target can reach 340mm
certification
ROHS
bongding
OK

 

High Purity 4N5 Titanium Sputtering Target Round Discs Target For Coating 0

 

Features :

High purity: Titanium sputtering targets are made from high-purity titanium metal, typically 99.99% or higher, to ensure the highest quality and consistency of the deposited thin film.

Customizable size and shape: Titanium sputtering targets are available in various sizes and shapes, including round, rectangular, and annular, to meet specific requirements of the sputtering process.

Good thermal and electrical conductivity: Titanium sputtering targets have good thermal and electrical conductivity, making them suitable for a range of applications.

High melting point: Titanium has a high melting point of 1668°C, making it suitable for high-temperature sputtering applications.

 

Applications :

Semiconductor industry: Titanium sputtering targets are used in the semiconductor industry to deposit thin films of titanium and titanium-based materials for integrated circuits, microprocessors, and other electronic components.

Optics industry: Titanium sputtering targets are used in the optics industry to deposit thin films of titanium for mirrors, filters, and other optical components.

Solar energy industry: Titanium sputtering targets are used in the solar energy industry to deposit thin films of titanium and titanium-based materials for solar cells and other photovoltaic devices.

Automotive industry: Titanium sputtering targets are used in the automotive industry to deposit coatings on engine components to improve their performance and durability.

Medical devices: Titanium sputtering targets are used in the production of medical devices, including implants and diagnostic sensors, due to titanium's biocompatibility and corrosion resistance.