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Tantalum Plate 99.95% Pure Tantalum Sputtering Target / Tantalum Plate / Sheet / Disc

Product Details

Place of Origin: China

Brand Name: HaiChuan

Certification: ISO9001

Model Number: 21

Payment & Shipping Terms

Minimum Order Quantity: 10kg

Price: $280-300/kg

Packaging Details: wooden box

Delivery Time: 10-15days

Payment Terms: L/C, D/A, D/P, T/T, Western Union, MoneyGram

Supply Ability: 10ton per month

Get Best Price
Highlight:

99.95% Pure Sputtering Target

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Tantalum Sputtering Target

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tantalum Plate disc

Material:
Tantalum
Shape:
Custom,plate
Place Of Origin:
Jiangsu, China
Application:
Industry
Size:
Custom
Material:
Tantalum
Shape:
Custom,plate
Place Of Origin:
Jiangsu, China
Application:
Industry
Size:
Custom
Tantalum Plate 99.95% Pure Tantalum Sputtering Target / Tantalum Plate / Sheet / Disc

Tantalum Plate 99.95% Pure Tantalum Sputtering Target/tantalum Plate /sheet/disc

 

A tantalum sputtering target is a disc-shaped material made of high-purity tantalum metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms from the target surface and deposit them onto a substrate to create a thin film.

 

 

Product Name
molecular formula
Purity
Specification
Rhenium Target
Re
4N-5N
Customized for plane target, rotating target, tube target, etc.
Tantalum target
Ta
3N-4N
Niobium target
Nb
3N-4N
Vanadium target
V
3N-4N
Titanium target
Ti
2N5-4N
Chromium target
Cr
2N5-4N
Copper target
Cu
3N-5N
Aluminum target
Al
2N5-4N
Cobalt target
Co
3N5
Nickel target
Ni
3N-5N
Ruthenium target
Ru
3N-4N
Iridium target
Ir
3N-4N
Rhodium target
Rh
4N
Bismuth target
Bi
3N-4N
Palladium target
Pd
3N-4N
Silver target
Ag
4N-5N
Gold target
Au
4N-5N

 

Tantalum Plate 99.95% Pure Tantalum Sputtering Target / Tantalum Plate / Sheet / Disc 0

 

Features :

High purity: Tantalum sputtering targets are made from high-purity tantalum metal, typically 99.99% or higher, to ensure the highest quality and consistency of the deposited thin film.

Customizable size and shape: Tantalum sputtering targets are available in various sizes and shapes, including round, rectangular, and annular, to meet specific requirements of the sputtering process.

Good thermal and electrical conductivity: Tantalum sputtering targets have good thermal and electrical conductivity, making them suitable for a range of applications.

High melting point: Tantalum has a high melting point of 2996°C, making it suitable for high-temperature sputtering applications.

 

Applications :

Semiconductor industry: Tantalum sputtering targets are used in the semiconductor industry to deposit thin films of tantalum and tantalum-based materials for integrated circuits, microprocessors, and other electronic components.

Optics industry: Tantalum sputtering targets are used in the optics industry to deposit thin films of tantalum for mirrors, filters, and other optical components.

Aerospace industry: Tantalum sputtering targets are used in the aerospace industry to deposit coatings on spacecraft and satellites to improve their performance and durability.

Medical devices: Tantalum sputtering targets are used in the production of medical devices, including implants and diagnostic sensors, due to tantalum's biocompatibility and corrosion resistance.

Energy industry: Tantalum sputtering targets are used in the energy industry to deposit coatings on parts of nuclear reactors and in fuel cells to improve performance and durability.